Development of a System for Studies of Surface Structure during Plasma Processing and Student Training

该奖项来自DMR材料研究仪器项目，支持波士顿大学的仪器开发和学生培训。正在开发的新系统将首次能够在等离子体处理过程中使用同步x射线辐射对材料表面结构进行原位研究。该系统将允许一个现实的等离子体处理环境和必要的诊断访问，同时符合标准的四圈衍射仪提供的空间。该系统的一个重要优点是其可移植性，允许在同步加速器和其他实验室之间传输多个过程表征。该系统的初步研究将集中在进行高密度等离子体蚀刻的硅表面，以解决此类表面结构上可用数据的空白。该设备的未来应用将针对化合物半导体表面。该奖项来自DMR材料研究仪器项目，支持波士顿大学的仪器开发和学生培训。波士顿大学的教师和学生正在开发一种系统，可以研究表面的原子结构，因为它们在一系列统称为“等离子体处理”的过程中受到高能粒子的轰击。这些信息将促进我们对这些广泛应用于集成电路和微波器件制造的重要技术的基本理解。该系统将允许将用于等离子体处理材料的反应器集成到高通量x射线表征设施中。高通量的x射线将首次允许在等离子体处理过程中表征原子表面结构。

This award from the Instrumentation for Materials Research Program in DMR supports instrument development and student training at Boston University. The new system under development will enable, for the first time, the in-situ study with synchrotron x-ray radiation of materials' surface structure while undergoing plasma processing. The system will permit both a realistic plasma processing environment and the necessary diagnostic access while conforming to the space afforded by a standard four-circle diffractometer. An important advantage of the system is its portability, permitting transport between the synchrotron and other laboratories for multiple process characterizations. Initial studies with the system will concentrate on silicon surfaces undergoing high density plasma etching to address the void of data available on the structure of such surfaces. Future applications of the equipment will be directed at compound semiconductor surfaces.%%%This award from the Instrumentation for Materials Research Program in DMR supports instrument development and student training at Boston University. Faculty and students at Boston University are developing a system that will enable study of the atomic structure of surfaces as they are being bombarded by energetic particles in a set of processes known collectively as "plasma processing". Such information will advance our fundamental understanding of these important techniques that are widely used in the fabrication of integrated circuits and microwave devices. The system will allow the integration of a reactor used for plasma processing of materials into a high flux x-ray characterization facility. The high flux of x-rays will permit atomic surface structure characterization during plasma processing for the first time.