Synthesis and analysis of pure and metal-containing carbon coatings using HPPMS-PVD

拟议的项目是基于当前的项目“HPPMS- c - schichten”（BO 1979/33-1），该项目侧重于通过HPPMS（高功率脉冲磁控溅射）沉积a-C-和a-C:Me涂层，用于摩擦学应用，输入不同的能量到等离子体。采用氖气作为工艺气体，使涂层性能得到改善。然而，作为这个项目的结果，进一步改善涂层性能和涂层与沉积的a- c （:Me）涂层之间的复合附着力是必要的，以提高刀具在摩擦学应用中的适用性，如铝加工。在这方面，在我们自己的初步工作中，使用衬底温度TS < 250°C以及衬底温度的梯度，可以观察到有希望的结果。因此，对于用HPPMS沉积的a-C（:Me）涂层，这些影响应该进行更详细的研究。因此，拟议项目的总体目标是基本了解涂层性能的因果关系，以及在低温（TS < 250°C，特别是TS < 25°C）和等离子体输入不同能量下，通过HPPMS沉积a-C和a-C:Me涂层的复合附着力。因此，上述工艺参数对涂层微观结构、sp3/sp2键合比或残余应力等基本性能的影响与镀层的应用相关力学性能、复合附着力和热稳定性有关。这些研究的结果是一个尚未可用的修正结构区模型，以及a-C（:Me）涂层低温范围TS < 250°C的因果关系模型。进一步的目的是解释基材温度梯度对涂层性能和复合附着力以及热阻的影响。研究结果旨在有针对性地开发用于摩擦学应用的钢或硬质金属基板上的a- c （:Me）涂层。基板温度变化从TS = -90°C到TS = 250°C使用基板支架的液体接触冷却。HPPMS以不同的脉冲峰值功率来实现等离子体输入能量的变化。根据正在进行的项目BO 1979/33-1的发现，氖气被用作工艺气体。为了比较，考虑了a-C（:Zr）涂层。调查如BO 1979/33-1所示，在一家大型涂料厂进行。

The proposed project is based on the current project "HPPMS-C-Schichten" (BO 1979/33-1), which focuses on the deposition of a-C- and a-C:Me coatings for tribological applications by means of HPPMS (High Power Pulse Magnetron Sputtering) with varying energy input into the plasma. The use of neon as process gas led to an improvement of the coating properties. However, as a result of this project, a further improvement of the coating properties and the compound adhesion between coating and substrate of the deposited a-C(:Me) coatings is necessary in order to increase the suitability for tools in tribological applications such as Al machining. In this respect, promising results could be observed in our own preliminary work with the use of substrate temperatures TS < 250 °C as well as for a gradation of the substrate temperature. These effects should therefore be investigated in more detail for the deposition of a-C(:Me) coatings deposited by means of HPPMS.The overall objective of the proposed project is therefore a fundamental understanding of the cause-and-effect relationships of coating properties and the compound adhesion for the deposition of a-C and a-C:Me coatings by means of HPPMS at low substrate temperatures TS < 250 °C, in particular TS < 25 °C, and varying energy input into the plasma. For this purpose, the influence of the above-mentioned process parameters on basic coating properties such as the microstructure, the sp3/sp2 bond ratio or the residual stresses are correlated with the application-relevant mechanical properties, the compound adhesion and the thermal stability of the deposited coatings. The result of these investigations is a not yet available modified structure-zone model as well as a modeling of the cause-effect relationships for the low-temperature range TS < 250 °C for a-C(:Me) coatings. A further aim is the explanation of the influence of a substrate temperature gradation on the coating properties and the compound adhesion as well as the thermal resistance. The findings are intended to enable a targeted development of a-C(:Me) coatings on steel or hard metal substrates on tools for tribological applications. The substrate temperature is varied from TS = -90 °C to TS = 250 °C using a liquid contact cooling of the substrate holder. The variation of the energy input into the plasma is realized with different peak powers per pulse for the HPPMS. According to the findings of the ongoing project BO 1979/33-1 neon is used as process gas. For comparability, a-C(:Zr) coatings are considered. The investigations are as in BO 1979/33-1 carried out in a large-volume coating plant.