Low temperature fabrication of silicon-based thin film transistors (TFTs) for flat panel displays - an entirely new approach

该项目代表了一种全新的非晶硅低温结晶方法，并将其应用于平板显示器的TFT制造，并与澳大利亚高科技公司WRiota合作。这项研究是在国家高度优先的领域，即纳米技术，因为这项技术是基于通过纳米压痕在纳米尺度上对材料进行改性。该项目将进一步为许多研究生和ecr提供宝贵的机会，以获得工业界和学术界的经验以及澳大利亚纳米技术劳动力所需的技能。

This project represents an entirely new approach to low temperature crystallization of amorphous silicon, and its application to TFT fabrication in flat panel displays, and involves a partnership with the Australian high-tech company, WRiota. The research is in a field of high national priority, namely nanotechnology, since the technology is based on materials modification at the nanoscale by nanoindentation. This project will further provide valuable opportunities for a number of research students and ECRs to gain experience in both the industrial and academic worlds and skills needed for Australia's nanotechnology workforce.