Fabrication of Nanoscale Devices and Circuits using DNA Origami Technology

DNA折纸技术在制造纳米集成器件方面很有前途，但传统的光刻方法面临着局限性。研究了DNA折纸图案在硅衬底上的形成，阐明了硅衬底表面状态对DNA折纸图案的形成起着非常重要的作用。我们发现紫外线臭氧处理可以有效地形成设计的DNA折纸图案。我们还制作了耦合量子点和单电子晶体管的集成器件，并对其进行了表征。

DNA Origami technology is promising for the fabrication of nanoscale integrated devices, in which conventional lithography methods would face limitation. We studied formation of DNA Origami pattern on Si substrate and clarified that surface condition of Si substrate played a very important role. We found UV ozone treatment was effective to form DNA Origami pattern as designed. We also fabricated and characterized an integrated device of coupled quantum dots and an single electron transistor.