Development of spin-function on flexible semiconductors
Development of spin-function on flexible semiconductors
批准号:
21656005
负责人:
MIYAO Masanobu
金额:
$2.18万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2011
中文摘要
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英文摘要
To achieve spin-function on flexible semiconductors, a new low-temperature(. 350oC) crystallization technique of SiGe has been developed. Moreover, magnetic and electronic properties of ferromagnetic Heusler alloy/SiGe stacked structures have been clarified.
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Au誘起層交換成長法による多結晶Si/絶縁膜の極低温形成(~ 250oC)
通过金诱导层交换生长法低温形成多晶硅/绝缘膜(~ 250oC)
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[J.-H. Park, M. Kurosawa, N. Kawabata, M. Miyao, and T. Sadoh, 川畑直之,黒澤昌志,朴鍾.,佐道泰造,宮尾正信, 朴鍾.,黒澤昌志,川畑直之,宮尾正信,佐道泰造]
通讯作者:
朴鍾.,黒澤昌志,川畑直之,宮尾正信,佐道泰造
Comparison of nonlocal and local magnetoresistance signals in laterally fabricated Fe3Si/Si spin-valve devices
横向制造的 Fe3Si/Si 自旋阀器件中非局部和局部磁阻信号的比较
DOI:
--
发表时间:
2010
期刊:
APPLIED PHYSICS EXPRESS
影响因子:
2.3
作者:
[Y.Ando, et al.]
通讯作者:
et al.
Au-Catalyst Induced Low Temperature(~ 250oC) Layer Exchange Crystallization for SiGe On Insulator
Au 催化剂诱导绝缘体上 SiGe 的低温(~ 250oC)层交换结晶
DOI:
--
发表时间:
2011
期刊:
ECS Transactions
影响因子:
--
作者:
[J.-H. Park, M. Kurosawa, N. Kawabata, M. Miyao, and T. Sadoh]
通讯作者:
and T. Sadoh
A u誘起層交換成長法による大粒径G e(1 1 1)結晶/絶縁膜の形成:界面酸化膜挿入効果
通过Au诱导层交换生长法形成大晶粒尺寸G e(1 1 1)晶体/绝缘膜:界面氧化膜插入效应
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[Y.Ando, et al., 朴鍾.,鈴木恒晴,黒澤昌志,宮尾正信,佐道泰造]
通讯作者:
朴鍾.,鈴木恒晴,黒澤昌志,宮尾正信,佐道泰造
Low-temperature (~250oC) Crystallization of Poly-SiGe Films by Gold-Induced Layer-Exchange Technique for Flexible Electronics
利用金诱导层交换技术实现柔性电子多晶硅Ge薄膜的低温(~250oC)结晶
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[J.Park, et al]
通讯作者:
et al
共 27 条
Non-Thermal-Equilibrium Solid-Phase Crystallization of GeSn-on-Insulator on Si Platform
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批准号:25289089
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$11.07万
-
财政年份:2013
-
负责人:MIYAO Masanobu
-
依托单位:
Development of Hetero-Materials Integration Technology for Multi-Functional Hybrid Large-Scale Integrated Circuits
-
批准号:24656209
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
-
财政年份:2012
-
负责人:MIYAO Masanobu
-
依托单位:
Atomically-control of halfmetal/Si interface for spin-transistors
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批准号:22360127
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$11.9万
-
财政年份:2010
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负责人:MIYAO Masanobu
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依托单位:
High-Quality Formation of SiGe on Flexible Substrates for Transistor Application
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批准号:19360011
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$11.81万
-
财政年份:2007
-
负责人:MIYAO Masanobu
-
依托单位:
Growth of Ferromagnetic Silicide for Source/Drain Engineering
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批准号:18063018
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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资助金额:$34.3万
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财政年份:2006
-
负责人:MIYAO Masanobu
-
依托单位:
Low-temperature orientation-control of SiGe quasi-single crystal on glass and its device application
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批准号:15360169
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$8.19万
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财政年份:2003
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负责人:MIYAO Masanobu
-
依托单位:
Formation of Si Quasi-Single Crystal by Controlled Excess Vacancy
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批准号:12450015
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$9.47万
-
财政年份:2000
-
负责人:MIYAO Masanobu
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依托单位:
海外基金