Japanese Language Award for George Collins
Japanese Language Award for George Collins
批准号:
9000527
负责人:
George Collins
金额:
$0.82万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1990
资助国家:
美国
项目状态:
已结题
起止时间:
1990-04-15 至 1991-03-31
中文摘要
点击翻译按钮获取中文摘要
英文摘要
This award will support study of the Japanese language by an American scientist or engineer by providing a stipend, tuition, or other course-related expenses. The objectives of the program are to enable active U.S. scientists and engineers to acquire sufficient familiarity with the language and customs of Japan to allow them to function independently there; or to acquire sufficient expertise in reading Japanese to be able to understand technical abstracts in their field of interest. There is a critical need for more effective technical communication between American and Japanese researchers. This award is intended to help remove language and cultural barriers to U.S.-Japanese cooperative research and to facilitate science and technology exchange.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Higher Fidelity Etch Profiles and Reduced Charge Damage in Integrated Circuit Manufacturing by Neutralizing Charge Imbalances During Plasma Etch
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批准号:0097061
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项目类别:Standard Grant
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资助金额:$21.0万
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财政年份:2001
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负责人:George Collins
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依托单位:
Cylindrical Algebraic Decomposition and Quantifier Elimination
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批准号:9712246
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项目类别:Standard Grant
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资助金额:$9.51万
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财政年份:1997
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负责人:George Collins
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依托单位:
Electron Beam Curing and Planarization of Spin-on Glass
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批准号:9720292
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项目类别:Continuing Grant
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资助金额:$31.1万
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财政年份:1997
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负责人:George Collins
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依托单位:
U.S.-Japan Cooperative Science: Exploring Electron Beam Assisted ALE and P-Type Conductivity Control of III-V Nitrides
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批准号:9512857
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项目类别:Standard Grant
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资助金额:$2.08万
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财政年份:1996
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负责人:George Collins
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依托单位:
GOALI/IUCRP: Uniform Grain Size Polysilicon for Thin Film Transistors
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批准号:9424399
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项目类别:Continuing Grant
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资助金额:$33.15万
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财政年份:1995
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负责人:George Collins
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依托单位:
Engineering Faculty Internship: Quantifying Plasma Generated Particle and Charge Build Up Damage in Submicron Manufacturing
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批准号:9311697
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项目类别:Standard Grant
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资助金额:$2.5万
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财政年份:1993
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负责人:George Collins
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依托单位:
Engineering Research Deployment Teaching Initiative: Plasma and Beam Induced Chemistry for Materials Processing
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批准号:9310403
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项目类别:Standard Grant
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资助金额:$2.5万
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财政年份:1993
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负责人:George Collins
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依托单位:
Electron Beam Curing of Polymer Resists
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批准号:9108531
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项目类别:Continuing Grant
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资助金额:$31.37万
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财政年份:1992
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负责人:George Collins
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依托单位:
Effects of Photons on Gallium Arsenide Epitaxy
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批准号:9108456
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项目类别:Standard Grant
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资助金额:$3.5万
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财政年份:1991
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负责人:George Collins
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依托单位:
U.S Japan Long Term Visit: Photon and Reactive Gas AssistedHeteroepitaxy of III-V and II-VI Optoelectronic Films
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批准号:9007937
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项目类别:Standard Grant
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资助金额:$17.7万
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财政年份:1991
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负责人:George Collins
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依托单位:
Acquisition of a Liquid Cesium Ion Source
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批准号:9004593
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项目类别:Standard Grant
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资助金额:$2.2万
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财政年份:1990
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负责人:George Collins
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依托单位:
Research on Cylindrical Algebraic Computation
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批准号:8913824
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:1990
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负责人:George Collins
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依托单位:
U.S.-China Cooperative Research: Cylindrical Magnetron Plasma Modeling and Associated Laser Rate Equations
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批准号:8913426
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项目类别:Standard Grant
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资助金额:$2.38万
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财政年份:1990
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负责人:George Collins
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依托单位:
Japanese Language Award for George Collins
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批准号:8903088
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项目类别:Standard Grant
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资助金额:$0.56万
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财政年份:1989
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负责人:George Collins
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依托单位:
Engineering Research Equipment Grant - Single Wafer Reactor
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批准号:8906311
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项目类别:Standard Grant
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资助金额:$2.0万
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财政年份:1989
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负责人:George Collins
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依托单位:
Magnetron Excited Ultraviolet Ion Lasers (REU Supplement)
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批准号:8815051
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项目类别:Continuing Grant
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资助金额:$37.13万
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财政年份:1989
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负责人:George Collins
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依托单位:
Hydrogen Assisted Fabrication of Optoelectronic Devices Utilizing GaAs on Si and GaAs on SiO2
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批准号:8806851
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项目类别:Standard Grant
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资助金额:$4.8万
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财政年份:1988
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负责人:George Collins
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依托单位:
Algebraic Algorithms and Systems (Computer Research)
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批准号:8696129
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项目类别:Continuing grant
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资助金额:$0.0万
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财政年份:1986
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负责人:George Collins
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依托单位:
U.S.-Australian Cooperative Research: Electron Beam Pumped Metal Vapor Recombination Lasers at Room Temperature (Elec- trical Engineering)
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批准号:8500540
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项目类别:Standard Grant
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资助金额:$0.64万
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财政年份:1986
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负责人:George Collins
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依托单位:
Engineering Research Equipment Grant: Epitaxial Reactor
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批准号:8506506
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项目类别:Standard Grant
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资助金额:$6.8万
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财政年份:1985
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负责人:George Collins
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依托单位:
海外基金