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U.S.-China Cooperative Research: Cylindrical Magnetron Plasma Modeling and Associated Laser Rate Equations

U.S.-China Cooperative Research: Cylindrical Magnetron Plasma Modeling and Associated Laser Rate Equations
中美合作研究:圆柱形磁控管等离子体建模和相关激光速率方程
批准号:
8913426
负责人:
George Collins
金额:
$2.38万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1990
资助国家:
美国
项目状态:
已结题
起止时间:
1990-07-01 至 1992-06-30

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中文摘要
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英文摘要
This is a one-year collaborative research project between Dr. George Collins, Colorado State University and Professor Shi Binxing, Tsinghua University. This project plans to study the laser field using powerful continuous UV sources. This study tests a new approach which couples a magnetron discharge with auxiliary e-beam pumping. The goal is to develop single device laser operating in the UV and VUV spectral region. If successful, these will be used for many scientific and technological applications, including cell sorting, drug processing, direct photolithography, etc. This is a collaborative study jointly support by the NSF and the Chinese State Education Commission. U;.
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Higher Fidelity Etch Profiles and Reduced Charge Damage in Integrated Circuit Manufacturing by Neutralizing Charge Imbalances During Plasma Etch
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