课题基金 / 基金详情

Magnetron Excited Ultraviolet Ion Lasers (REU Supplement)

Magnetron Excited Ultraviolet Ion Lasers (REU Supplement)
磁控管激发紫外离子激光器(REU 补充)
批准号:
8815051
负责人:
George Collins
金额:
$37.13万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1989
资助国家:
美国
项目状态:
已结题
起止时间:
1989-02-15 至 1992-07-31

项目摘要

项目成果

George Collins的其他基金

相似基金

相关文献

中文摘要
翻译
点击翻译按钮获取中文摘要
英文摘要
This program will investigate continuous wave UV/VUV lasers operating in the 150-300 nm region, where presently no such lasers exist. A new discharge will be used, the low pressure cyclindrical magnetron, to pump rare gas metal vapor lasers: Ag+, Cu+, Pb+, Mg+ and Ga+. The magnetron discharge is considered to be especially well suited to rare gas-metal vapor lasers. Running on their own the magnetron lasers are expected to provide milliwatts of single transverse mode UV, while the use of auxillary low energy 0.1 KeV - 1 KeV electron beam pumping should enable UV/VUV operation at the watt level. Cold cathode, grided cold cathode, and plasma cathode electron guns will be used for low voltage 0.1 KeV - 1 KeV electron beam generation. Detailed plasma diagnostic studies will be made of both the independent magentron discharge and the electron beam pumped magnetron plasma. The energy spectrum of the longitudinal electron beam will be measured along the length of the magnetron discharge using newly developed Faraday probes with apertures and grids. Laser spectroscopy will measure sheath electric fields and excited state densities versus operating conditions. Plasma data will be compared to Boltzmann computer models developed especially for the magnetron plasma. Rate equation laser models will be constructed and results compared to experimental optimization of these same lasers excited in the cyclindrical magnetron configuration.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Higher Fidelity Etch Profiles and Reduced Charge Damage in Integrated Circuit Manufacturing by Neutralizing Charge Imbalances During Plasma Etch
  • 批准号:
    0097061
  • 项目类别:
    Standard Grant
  • 资助金额:
    $21.0万
  • 财政年份:
    2001
  • 负责人:
    George Collins
  • 依托单位:
Cylindrical Algebraic Decomposition and Quantifier Elimination
  • 批准号:
    9712246
  • 项目类别:
    Standard Grant
  • 资助金额:
    $9.51万
  • 财政年份:
    1997
  • 负责人:
    George Collins
  • 依托单位:
Electron Beam Curing and Planarization of Spin-on Glass
  • 批准号:
    9720292
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $31.1万
  • 财政年份:
    1997
  • 负责人:
    George Collins
  • 依托单位:
U.S.-Japan Cooperative Science: Exploring Electron Beam Assisted ALE and P-Type Conductivity Control of III-V Nitrides
  • 批准号:
    9512857
  • 项目类别:
    Standard Grant
  • 资助金额:
    $2.08万
  • 财政年份:
    1996
  • 负责人:
    George Collins
  • 依托单位:
海外基金