Magnetron Excited Ultraviolet Ion Lasers (REU Supplement)
Magnetron Excited Ultraviolet Ion Lasers (REU Supplement)
批准号:
8815051
负责人:
George Collins
金额:
$37.13万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1989
资助国家:
美国
项目状态:
已结题
起止时间:
1989-02-15 至 1992-07-31
中文摘要
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英文摘要
This program will investigate continuous wave UV/VUV lasers operating in the 150-300 nm region, where presently no such lasers exist. A new discharge will be used, the low pressure cyclindrical magnetron, to pump rare gas metal vapor lasers: Ag+, Cu+, Pb+, Mg+ and Ga+. The magnetron discharge is considered to be especially well suited to rare gas-metal vapor lasers. Running on their own the magnetron lasers are expected to provide milliwatts of single transverse mode UV, while the use of auxillary low energy 0.1 KeV - 1 KeV electron beam pumping should enable UV/VUV operation at the watt level. Cold cathode, grided cold cathode, and plasma cathode electron guns will be used for low voltage 0.1 KeV - 1 KeV electron beam generation. Detailed plasma diagnostic studies will be made of both the independent magentron discharge and the electron beam pumped magnetron plasma. The energy spectrum of the longitudinal electron beam will be measured along the length of the magnetron discharge using newly developed Faraday probes with apertures and grids. Laser spectroscopy will measure sheath electric fields and excited state densities versus operating conditions. Plasma data will be compared to Boltzmann computer models developed especially for the magnetron plasma. Rate equation laser models will be constructed and results compared to experimental optimization of these same lasers excited in the cyclindrical magnetron configuration.
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Higher Fidelity Etch Profiles and Reduced Charge Damage in Integrated Circuit Manufacturing by Neutralizing Charge Imbalances During Plasma Etch
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批准号:0097061
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项目类别:Standard Grant
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资助金额:$21.0万
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财政年份:2001
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负责人:George Collins
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依托单位:
Cylindrical Algebraic Decomposition and Quantifier Elimination
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批准号:9712246
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项目类别:Standard Grant
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资助金额:$9.51万
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财政年份:1997
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负责人:George Collins
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依托单位:
Electron Beam Curing and Planarization of Spin-on Glass
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批准号:9720292
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项目类别:Continuing Grant
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资助金额:$31.1万
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财政年份:1997
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负责人:George Collins
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依托单位:
U.S.-Japan Cooperative Science: Exploring Electron Beam Assisted ALE and P-Type Conductivity Control of III-V Nitrides
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批准号:9512857
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项目类别:Standard Grant
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资助金额:$2.08万
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财政年份:1996
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负责人:George Collins
-
依托单位:
GOALI/IUCRP: Uniform Grain Size Polysilicon for Thin Film Transistors
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批准号:9424399
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项目类别:Continuing Grant
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资助金额:$33.15万
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财政年份:1995
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负责人:George Collins
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依托单位:
Engineering Faculty Internship: Quantifying Plasma Generated Particle and Charge Build Up Damage in Submicron Manufacturing
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批准号:9311697
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项目类别:Standard Grant
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资助金额:$2.5万
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财政年份:1993
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负责人:George Collins
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依托单位:
Engineering Research Deployment Teaching Initiative: Plasma and Beam Induced Chemistry for Materials Processing
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批准号:9310403
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项目类别:Standard Grant
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资助金额:$2.5万
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财政年份:1993
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负责人:George Collins
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依托单位:
Electron Beam Curing of Polymer Resists
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批准号:9108531
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项目类别:Continuing Grant
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资助金额:$31.37万
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财政年份:1992
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负责人:George Collins
-
依托单位:
Effects of Photons on Gallium Arsenide Epitaxy
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批准号:9108456
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项目类别:Standard Grant
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资助金额:$3.5万
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财政年份:1991
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负责人:George Collins
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依托单位:
U.S Japan Long Term Visit: Photon and Reactive Gas AssistedHeteroepitaxy of III-V and II-VI Optoelectronic Films
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批准号:9007937
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项目类别:Standard Grant
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资助金额:$17.7万
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财政年份:1991
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负责人:George Collins
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依托单位:
Acquisition of a Liquid Cesium Ion Source
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批准号:9004593
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项目类别:Standard Grant
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资助金额:$2.2万
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财政年份:1990
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负责人:George Collins
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依托单位:
Japanese Language Award for George Collins
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批准号:9000527
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项目类别:Standard Grant
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资助金额:$0.82万
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财政年份:1990
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负责人:George Collins
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依托单位:
Research on Cylindrical Algebraic Computation
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批准号:8913824
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:1990
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负责人:George Collins
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依托单位:
U.S.-China Cooperative Research: Cylindrical Magnetron Plasma Modeling and Associated Laser Rate Equations
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批准号:8913426
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项目类别:Standard Grant
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资助金额:$2.38万
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财政年份:1990
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负责人:George Collins
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依托单位:
Japanese Language Award for George Collins
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批准号:8903088
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项目类别:Standard Grant
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资助金额:$0.56万
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财政年份:1989
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负责人:George Collins
-
依托单位:
Engineering Research Equipment Grant - Single Wafer Reactor
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批准号:8906311
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项目类别:Standard Grant
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资助金额:$2.0万
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财政年份:1989
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负责人:George Collins
-
依托单位:
Hydrogen Assisted Fabrication of Optoelectronic Devices Utilizing GaAs on Si and GaAs on SiO2
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批准号:8806851
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项目类别:Standard Grant
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资助金额:$4.8万
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财政年份:1988
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负责人:George Collins
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依托单位:
Algebraic Algorithms and Systems (Computer Research)
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批准号:8696129
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项目类别:Continuing grant
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资助金额:$0.0万
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财政年份:1986
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负责人:George Collins
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依托单位:
U.S.-Australian Cooperative Research: Electron Beam Pumped Metal Vapor Recombination Lasers at Room Temperature (Elec- trical Engineering)
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批准号:8500540
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项目类别:Standard Grant
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资助金额:$0.64万
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财政年份:1986
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负责人:George Collins
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依托单位:
Engineering Research Equipment Grant: Epitaxial Reactor
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批准号:8506506
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项目类别:Standard Grant
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资助金额:$6.8万
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财政年份:1985
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负责人:George Collins
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依托单位:
海外基金