Acquisition of an Electron Beam Nanolithography System

该MRI提案涉及为里海大学的研究和教育项目采购超高分辨率电子束（E-Beam）纳米光刻和计量系统。电子束系统为大学、工业和政府研究人员制造新型器件结构和表征材料的纳米特征提供了独特的能力。该E-B赚取系统将为研究人员提供一个机会，实现制造介观和量子器件的纳米光刻特性，如量子点非易失性半导体存储器、单电子晶体管、生物传感器和纳米仪器微机电系统（MEMS）。此外，电子束系统将为纳米技术提供卓越的教育指导。器件的制造需要集成过程，其中需要数百个操作才能实现最终的器件结构。为了实现这种过程的无缝集成，电子束纳米光刻和计量系统必须位于相同的物理基础设施中。例如，纳米电子器件和MEMS与生物样品制备的紧密耦合对于完成诸如细胞表征和DNA电子测序等任务至关重要。最后，电子束系统将服务于利哈伊山谷的周边社区，特别是当地的大学和K-12学生，以激发学生进入新兴的纳米技术世界。

This MRI Proposal involves the procurement of an Ultra-High Resolution Electron Beam (E-Beam) Nanolithography and Metrology System for research and education programs at Lehigh University. The E-Beam system offers a unique capability to university, industry and government researchers to fabricate novel device structures and to characterize the nanometric features of materials. This E-B earn system will provide an opportunity for researchers to realize nanolithographic features for the fabrication of mesoscopic and quantum devices, such as quantum-dot nonvolatile semiconductor memories, single electron transistors, biosensors, and nanoscopic-instrumented, microelectromechanical systems (MEMS). In addition, the E-Beam system will provide exceptional educational instruction into nanotechnology. The fabrication of devices requires the integration of processes where literally several hundred operations are needed to realize a final device structure. In order to accomplish this seamless integration of processes an E-Beam Nanolithograpy and Metrology System must be located literally within the same physical infrastructure. For example, the close coupling of nanoelectronics devices and MEMS with the preparation of biological samples is essential to accomplish tasks such as cell characterization and electronic sequencing of DNA. Finally, the E-Beam system will serve the surrounding community within the Lehigh Valley particularly the local colleges and K-12 students to excite students into the emerging world of nanotechnology.