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Research for ultra-fast operation of InP HBT by ballistic transportation in collector

Research for ultra-fast operation of InP HBT by ballistic transportation in collector
InP HBT在收集器中弹道输运超快运行研究
批准号:
16360170
负责人:
MIYAMOTO Yasuyuki
金额:
$9.54万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2004
资助国家:
日本
项目状态:
已结题
起止时间:
2004 至 2006

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中文摘要
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英文摘要
Obtained results in this study are as follows :Electron velocity in the collector was estimated by Monte Carlo simulation. In the heterojunction bipolar transistor with 100 nm thick collector, electron velocity is over 4x10^7cm/s at first 40 nm, but the velocity is less than 2x10^7cm/s at final 20 nm. With base thickness of 25 nm, estimated cutoff frequency is about 630 GHz.Thus we propose hot electron transistors with intrinsic semiconductor as propagation region for ballistic transportation and thermionic hetero-launcher for high drivability controlled by insulated gate. Electron speed in the collector is over 7x10^7cm/s and cutoff frequency over 1 THz is estimated when collector current density is over 1000 kA/cm^2.Heterojunction bipolar transistors with 0.1um wide buried metal wires showed 0.6 fF as total collector capacitance. To our knowledge, this is the smallest capacitance. However, electron flux from side of the wire limits further improvement. Thus we proposed heterojunction bipolar transistors with SiO_2 wire under base contact region. 200-nm-thick wires were buried in heterojunction bipolar transistor structure with flat hetero-interface. In the transistors with SiO_2 wire, no serious degradation was observed in DC measurements. Hot electron transistors with insulated gate and thermionic hetero-launcher were fabricated. Good isolation of gate and collector current control by gate bias were confirmed.
期刊论文(12)
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会议论文
Current Gain and Voltage Gain in Hot Electron Transistors without Base Layer
无基层热电子晶体管的电流增益和电压增益
DOI: --
发表时间: 2006
期刊: Trans.IECE of Japan E89-C, 7
影响因子: --
作者: [Y.Miyamoto, A.Suwa, Y.Miyamoto, K.Nishihori, Yasuyuki MIYAMOTO]
通讯作者: Yasuyuki MIYAMOTO
InP buried growth of Si02 wires toward reduction of collector capacitance in HBT
InP 掩埋生长 SiO2 线以减少 HBT 中的集电极电容
DOI: --
发表时间: 2007
期刊: J. Cryst, Growth 298
影响因子: --
作者: [Y.Miyamoto]
通讯作者: Y.Miyamoto
Charging Time of Double-Layer Emitter in Heterojunction Bipolar Transistor Based on Transmission Formalism
基于传输形式的异质结双极晶体管双层发射极充电时间
DOI: --
发表时间: 2006
期刊: Jpn.J.Appl.Phys. 45・35
影响因子: --
作者: [Y.Miyamoto, A.Suwa, Y.Miyamoto, K.Nishihori, Yasuyuki MIYAMOTO, Nobuya Machida]
通讯作者: Nobuya Machida
Analysis of lateral current spreading in collector of submicron HBT
亚微米HBT集电极横向电流分布分析
DOI: --
发表时间: 2005
期刊: International Conference on Indium Phosphide and Related Materials (発表予定)
影响因子: --
作者: [Y.Miyamoto, A.Suwa, Y.Miyamoto, K.Nishihori, Yasuyuki MIYAMOTO, Nobuya Machida, Yasuyuki MIYAMOTO, Yasuyuki Miyamoto, Kazuhito Furuya, 小池 康晴, Y.Watanabe]
通讯作者: Y.Watanabe
10
    Complementary vertical tunnel FET aiming for low voltage and high speed operation by heterostructure design and miniaturization
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      26249046
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      Grant-in-Aid for Scientific Research (A)
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      2014
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      MIYAMOTO Yasuyuki
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      19206038
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      MIYAMOTO Yasuyuki
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      14350182
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      $9.66万
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      2002
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    Improving Crystal Conditions of Compound Semiconductors Laterally Grown on Metal Wire
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      11450006
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      1999
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      MIYAMOTO Yasuyuki
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    • 批准号:
      12404464
    • 项目类别:
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    • 资助金额:
      30万元
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    • 项目类别:
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    • 资助金额:
      30万元
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