I-Corps: Aluminum Nitride-based Power Transistors
I-Corps:氮化铝基功率晶体管
基本信息
- 批准号:1933825
- 负责人:
- 金额:$ 5万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2019
- 资助国家:美国
- 起止时间:2019-06-15 至 2019-11-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The broader impact/commercial potential of this I-Corps project is to expand the limits of high-frequency, high-power signal amplification. This will be necessary for future wireless communications systems, including sixth generation (6G) wireless technology. 6G will require higher operation frequencies to enable much faster data transmission. As frequency increases, signal strength diminishes over much shorter distances. To offset this issue, signals must also be transmitted at higher powers to be able to carry the signal the necessary distance. The demand for this combination of high-power, high-frequency is expected to continue to grow, and the devices developed here are designed to achieve such performance. High-power, high-frequency data transmission is also an issue for self-driving cars. High-frequency signals enable detailed, real time mapping of a car's surroundings. High-power ensures the signal can travel through rain and fog, and return to the car before weakening beyond detection. The devices developed here can enable more detailed mapping at a longer range to make self-driving cars smarter and safer.This i-Corps project develops aluminum nitride (AlN) as a new platform for gallium nitride (GaN) transistors. The material advantages of an aluminum nitride platform over the traditional GaN platform are two-fold. AlN is much more electrically resistive than GaN, which prevents undesired leakage currents that hurt device performance. At the same time, the thermal conductivity of AlN is approximately 50% larger than that of GaN. The result is more efficient heat dissipation, enabling device operation at higher power. The research behind AlN-based power transistors is focused on crystal growth and device fabrication. Optimized crystal growth enables high quality AlN and GaN, improving device performance. The as-grown crystal is then processed into transistors, which requires state-of-the-art fabrication tools and refined processes. The AlN transistors have demonstrated high breakdown voltages when compared to state-of-the-art GaN-based transistors, a key measure for power performance.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
该I-Corps项目的更广泛的影响/商业潜力是扩大高频,高功率信号扩增的限制。这对于未来的无线通信系统(包括第六代(6G)无线技术)是必需的。 6G将需要更高的操作频率以实现更快的数据传输。随着频率的增加,信号强度在较短的距离上会降低。为了抵消此问题,还必须以更高的力量传输信号,以便能够以必要的距离携带信号。预计高功率,高频的组合的需求将继续增长,此处开发的设备旨在实现此类性能。高功率,高频数据传输也是自动驾驶汽车的问题。高频信号可以详细绘制汽车周围环境的实时映射。高功率确保信号可以通过雨水和雾气传播,并在削弱被发现之前返回汽车。此处开发的设备可以使更详细的映射在更长的范围内使自动驾驶汽车更加聪明,更安全。该I-Corps项目开发了氮化铝(ALN),成为氮化凝剂(GAN)晶体管的新平台。氮化铝平台比传统的GAN平台的物质优势是两个方面。 ALN比GAN更具电阻,后者防止了损害设备性能的不想要的泄漏电流。同时,ALN的热导率比GAN大约50%。结果是更有效的散热,使设备以更高的功率运行。基于ALN的功率晶体管背后的研究集中在晶体生长和装置制造上。优化的晶体生长可实现高质量的ALN和GAN,从而提高了设备性能。然后将生长的晶体加工到晶体管中,这需要最先进的制造工具和精制过程。与最先进的基于GAN的晶体管相比,ALN晶体管表现出很高的分解电压,这是对电力性能的关键措施。该奖项反映了NSF的法定任务,并被认为是通过基金会的智力优点和更广泛的影响来通过评估来获得支持的审查标准。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Debdeep Jena其他文献
Growth, catalysis, and faceting of α-Ga2O3 and α-(InxGa1−x)2O3 on m-plane α-Al2O3 by molecular beam epitaxy
分子束外延法在 m 面 α-Al2O3 上生长、催化和面对 α-Ga2O3 和 α-(InxGa1−x)2O3
- DOI:
- 发表时间:
2023 - 期刊:
- 影响因子:6.1
- 作者:
Martin S. Williams;M. Alonso;M. Schowalter;A. Karg;Sushma Raghuvansy;Jon P. McCandless;Debdeep Jena;A. Rosenauer;Martin Eickhoff;Patrick Vogt - 通讯作者:
Patrick Vogt
スパッタアニールAlN上GaN/AlN 2次元正孔ガス構造の電気特性評価と微細構造解析
溅射退火AlN上GaN/AlN二维空穴气体结构的电性能评估和微观结构分析
- DOI:
- 发表时间:
2022 - 期刊:
- 影响因子:0
- 作者:
西村 海音;中西 悠太;林 侑介;藤平 哲也;Chaudhuri Reet;Cho Yongjin;Xing Huili (Grace);Debdeep Jena;上杉 謙次郎;三宅 秀人;酒井 朗 - 通讯作者:
酒井 朗
Evidence of many-body, fermi-energy edge singularity in InN films grown on GaN buffer layers
GaN 缓冲层上生长的 InN 薄膜中多体费米能边缘奇点的证据
- DOI:
- 发表时间:
2007 - 期刊:
- 影响因子:0
- 作者:
Xiaodong Mu;Yujie J. Ding;Kejia Wang;Debdeep Jena;J. Khurgin - 通讯作者:
J. Khurgin
Growth windows of epitaxial NbN x films on c -plane sapphire and their structural and superconducting properties
c面蓝宝石外延NbN x 薄膜的生长窗口及其结构和超导性能
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
J. Wright;Huili Grace;Debdeep Jena - 通讯作者:
Debdeep Jena
Tight-binding band structure of β- and α-phase Ga2O3 and Al2O3
β相和α相Ga2O3和Al2O3的紧结合能带结构
- DOI:
10.1063/5.0074598 - 发表时间:
2021 - 期刊:
- 影响因子:3.2
- 作者:
Yifan Zhang;Mengren Liu;G. Khalsa;Debdeep Jena - 通讯作者:
Debdeep Jena
Debdeep Jena的其他文献
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{{ truncateString('Debdeep Jena', 18)}}的其他基金
RAISE-TAQS: Integrated Room Temperature Single-Photon based Quantum-Secure LiFi Systems
RAISE-TAQS:集成室温单光子量子安全 LiFi 系统
- 批准号:
1839196 - 财政年份:2018
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
Polarization-Driven Electron-Hole Bilayers in Quantum Wells
量子阱中偏振驱动的电子空穴双层
- 批准号:
1710298 - 财政年份:2017
- 资助金额:
$ 5万 - 项目类别:
Continuing Grant
EFRI NewLAW: Non-Reciprocal Wave Propagation Devices by Fermionic Emulation and Exceptional Point Physics
EFRI NewLAW:通过费米子仿真和异常点物理实现非互易波传播装置
- 批准号:
1741694 - 财政年份:2017
- 资助金额:
$ 5万 - 项目类别:
Continuing Grant
DMREF: Collaborative Research: Extreme Bandgap Semiconductors
DMREF:协作研究:极限带隙半导体
- 批准号:
1534303 - 财政年份:2015
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
2D Crystal Semiconductors: Electron Transport and Device Applications
2D 晶体半导体:电子传输和器件应用
- 批准号:
1523356 - 财政年份:2015
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
2D Crystal Semiconductors: Electron Transport and Device Applications
2D 晶体半导体:电子传输和器件应用
- 批准号:
1232191 - 财政年份:2012
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
Nanoscale Optoelectronics with Polarization and Bandgap Engineered Nitride Nanowire/Silicon Heterostructures
具有偏振和带隙工程氮化物纳米线/硅异质结构的纳米级光电器件
- 批准号:
0907583 - 财政年份:2009
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
Evaluation of Graphene Nanoribbons for Lateral Bandgap Engineered Devices
用于横向带隙工程器件的石墨烯纳米带的评估
- 批准号:
0802125 - 财政年份:2008
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
CAREER: Dielectric Engineering of Quantum Wire Solids: Fundamentals to Applications
职业:量子线固体的介电工程:应用基础
- 批准号:
0645698 - 财政年份:2007
- 资助金额:
$ 5万 - 项目类别:
Continuing Grant
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