Fabrication of first 337 nm laser diodes for biological applications
Fabrication of first 337 nm laser diodes for biological applications
批准号:
EP/F033826/1
负责人:
Martin Kuball
金额:
$2.11万
依托单位:
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2008
资助国家:
英国
项目状态:
已结题
起止时间:
2008 至 --
中文摘要
点击翻译按钮获取中文摘要
英文摘要
Recently, with the unfortunate emergence of bio-terrorism and its threat to both military targets and civilian populations, it is necessary to develop a portable and cheap system to continuously monitor for any potential aerosolized agents (biological particles) released from deadly biological weapons in any open area, even in harsh environments. As most bio-molecules show strong absorption in the ultra-violet (UV) spectral region ranging from 280 to 340 nm, an efficient UV lighting source is expected to be a crucial component for next-generation biological detection, biological imaging and disease analysis applications. In particular use of UV laser diodes would enable high sensitivity detection systems. III-nitride semiconductors are the best materials to make such laser diodes. In last decade, there have been major achievements in this area. However, the achievements are limited to the violet/blue spectral region, with those devices mainly based on the InGaN alloy. Due to a number of challenges in material growth, a 343 nm laser diode is the shortest one so far reported. Obviously, such a laser diode is not short enough to be employable for above applications.Target of this exploratory project is the development of the first 337 nm UV laser diode based on the GaN/AlGaN material system to replace currently used N2 gas-based lasers. This work is based on recent major advances of the here involved UK teams in the field of III-nitride semiconductors. Further applications of the technology involve biological imaging as an efficient method to detect diseases in a human body, for example, cancerous tissues.
期刊论文(1)
专著(0)
科研奖励(0)
会议论文
Stimulated emission at 340 nm from AlGaN multiple quantum well grown using high temperature AlN buffer technologies on sapphire
使用高温 AlN 缓冲技术在蓝宝石上生长的 AlGaN 多量子阱的 340 nm 受激发射
DOI:
10.1063/1.3253416
发表时间:
2009
期刊:
Applied Physics Letters
影响因子:
4
作者:
[Wang Q]
通讯作者:
Wang Q
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国内基金
海外基金
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