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Magnetron Excited Ultraviolet Ion Lasers (REU Supplement)

Magnetron Excited Ultraviolet Ion Lasers (REU Supplement)
磁控管激发紫外离子激光器(REU 补充)
批准号:
8815051
负责人:
George Collins
金额:
$37.13万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1989
资助国家:
美国
项目状态:
已结题
起止时间:
1989-02-15 至 1992-07-31

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中文摘要
翻译
该计划将研究在150-300纳米区域工作的连续波UV/VUV激光器,目前还没有这样的激光器存在。本文将采用一种新的放电方式——低压圆筒磁控管,泵浦稀有气体金属蒸气激光器:Ag+、Cu+、Pb+、Mg+和Ga+。磁控管放电被认为特别适合于稀有气体-金属蒸汽激光器。磁控管激光器单独运行有望提供毫瓦的单横模紫外,而使用辅助的低能量0.1 KeV - 1 KeV电子束泵浦应使紫外/紫外操作达到瓦级。冷阴极、栅格冷阴极和等离子体阴极电子枪将用于产生0.1 KeV - 1 KeV的低压电子束。对独立磁控子放电和电子束抽运磁控管等离子体进行详细的等离子诊断研究。纵向电子束的能谱将沿着磁控管放电的长度使用新开发的法拉第探针的孔径和网格测量。激光光谱学将测量鞘层电场和激发态密度与操作条件的关系。等离子体数据将与专门为磁控管等离子体开发的玻尔兹曼计算机模型进行比较。建立了速率方程激光模型,并将结果与实验优化结果进行了比较。
英文摘要
This program will investigate continuous wave UV/VUV lasers operating in the 150-300 nm region, where presently no such lasers exist. A new discharge will be used, the low pressure cyclindrical magnetron, to pump rare gas metal vapor lasers: Ag+, Cu+, Pb+, Mg+ and Ga+. The magnetron discharge is considered to be especially well suited to rare gas-metal vapor lasers. Running on their own the magnetron lasers are expected to provide milliwatts of single transverse mode UV, while the use of auxillary low energy 0.1 KeV - 1 KeV electron beam pumping should enable UV/VUV operation at the watt level. Cold cathode, grided cold cathode, and plasma cathode electron guns will be used for low voltage 0.1 KeV - 1 KeV electron beam generation. Detailed plasma diagnostic studies will be made of both the independent magentron discharge and the electron beam pumped magnetron plasma. The energy spectrum of the longitudinal electron beam will be measured along the length of the magnetron discharge using newly developed Faraday probes with apertures and grids. Laser spectroscopy will measure sheath electric fields and excited state densities versus operating conditions. Plasma data will be compared to Boltzmann computer models developed especially for the magnetron plasma. Rate equation laser models will be constructed and results compared to experimental optimization of these same lasers excited in the cyclindrical magnetron configuration.
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Higher Fidelity Etch Profiles and Reduced Charge Damage in Integrated Circuit Manufacturing by Neutralizing Charge Imbalances During Plasma Etch
  • 批准号:
    0097061
  • 项目类别:
    Standard Grant
  • 资助金额:
    $21.0万
  • 财政年份:
    2001
  • 负责人:
    George Collins
  • 依托单位:
Cylindrical Algebraic Decomposition and Quantifier Elimination
  • 批准号:
    9712246
  • 项目类别:
    Standard Grant
  • 资助金额:
    $9.51万
  • 财政年份:
    1997
  • 负责人:
    George Collins
  • 依托单位:
Electron Beam Curing and Planarization of Spin-on Glass
  • 批准号:
    9720292
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $31.1万
  • 财政年份:
    1997
  • 负责人:
    George Collins
  • 依托单位:
U.S.-Japan Cooperative Science: Exploring Electron Beam Assisted ALE and P-Type Conductivity Control of III-V Nitrides
  • 批准号:
    9512857
  • 项目类别:
    Standard Grant
  • 资助金额:
    $2.08万
  • 财政年份:
    1996
  • 负责人:
    George Collins
  • 依托单位:
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