A research on silicon nano-devices for single-electron, quantum, CMOS integrated circuits operating at room temperature
A research on silicon nano-devices for single-electron, quantum, CMOS integrated circuits operating at room temperature
批准号:
16201029
负责人:
HIRAMOTO Toshiro
金额:
$31.7万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2004
资助国家:
日本
项目状态:
已结题
起止时间:
2004 至 2007
中文摘要
本研究旨在提出一种新的集成电路概念,将利用单电子/量子效应的新型功能器件与传统的在室温下工作的CMOS器件融合在一起。首先,研究了单电子晶体管的制备工艺。成功地获得了世界上最大的库仑阻塞振荡峰谷比和室温下的负微分电导。此外,首次在具有很小量子点的单空穴晶体管中实现了对库仑阻塞振荡峰位的精确控制。这种独特的特性源于量子点中巨大的量子能量间隔。接下来,对在室温下工作的单电子晶体管进行了集成。对工艺条件进行了微调,最终成功地集成了在室温下工作的单电子晶体管。此外,利用集成单电子晶体管的方法制作了模拟模式匹配电路,并在室温下演示了它们的工作原理。
英文摘要
This research aims at a new concept of integrate circuit in which new functional devices utilizing single-electron/quantum effect and conventional CMOS devices are merged operating at room temperature. At first, the fabrication process of single-electron transistors was developed. The world largest peak-to-valley current ratios of Coulomb blockade oscillations and negative differential conductance at room temperature were successfully obtained. Furthermore, the precise control of the peak position of the Coulomb blockade oscillations was achieved for the first time in single-hole transistors which have very small quantum dots. The unique characteristics originate from large quantum energy spacing in the quantum dot. Next, the integration of single-electron transistors operating at room temperature was pursued. The process conditions were finely tuned and finally, the single-electron transistors operating at room temperature were successfully integrated for the first time. Moreover, analog pattern matching circuits were fabricated by integrating single-electron transistors and their operations were demonstrated at room temperature.
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Experimental Study on Quantum Structure of Silicon Nano Wire and Its Impact on Nano Wire MOSFET and Single-Electron Transistor
硅纳米线量子结构及其对纳米线MOSFET和单电子晶体管影响的实验研究
DOI:
--
发表时间:
2006
期刊:
影响因子:
--
作者:
[Masaharu, Kobayashi, Toshiro Hiramoto]
通讯作者:
Toshiro Hiramoto
Effects of Channel Thinning on Threshold Voltage Shift in Ultrathin Body Silicon Nanocrystal Memories
沟道细化对超薄体硅纳米晶体存储器阈值电压漂移的影响
DOI:
--
发表时间:
2005
期刊:
Japanese Journal of Applied Physics Vol. 44, Part 1, No. 4B.
影响因子:
--
作者:
[K. Yanagidaira, M. Saitoh, T. Hiramoto]
通讯作者:
T. Hiramoto
Mobility Degradation in (110)-Oriented Ultra-thin Body Double-Gate pMOSFETs with SOI Thickness of less than 5nm
SOI 厚度小于 5nm 的 (110) 取向超薄体双栅极 pMOSFET 中的迁移率下降
DOI:
--
发表时间:
2007
期刊:
影响因子:
--
作者:
[Ken Shimizu, Toshiro Hiramoto]
通讯作者:
Toshiro Hiramoto
Control of full width at half maximum of Coulomb oscillation in silicon single-hole transistors at room temperature
室温下硅单孔晶体管库仑振荡半峰全宽的控制
DOI:
--
发表时间:
2007
期刊:
Applied Physics Letters Vol. 91, No. 5
影响因子:
--
作者:
[Kousuke Miyaji, Toshiro Hiramoto]
通讯作者:
Toshiro Hiramoto
DOI:
10.1109/iedm.2007.4419046
发表时间:
2007-12
期刊:
2007 IEEE International Electron Devices Meeting
影响因子:
--
作者:
[K. Shimizu;T. Hiramoto]
通讯作者:
K. Shimizu;T. Hiramoto
共 90 条
Basic research on influence of single impurity atom on statistics of nanoscale transistor characteristics
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批准号:26630148
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项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.5万
-
财政年份:2014
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Basic research on ultra-low voltage MOS transistors aiming at sub-100mV operation
-
批准号:25630135
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
-
财政年份:2013
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负责人:HIRAMOTO Toshiro
-
依托单位:
Nano MOSFET Fluctuations and Device Integrity
-
批准号:18063006
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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资助金额:$32.77万
-
财政年份:2006
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Exploration of Physics and Integration of Nano-Scale MOSEFET with Suppressed Fluctuations
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批准号:13450135
-
项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.47万
-
财政年份:2001
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Fabrication of Silicon Nano-Devices with High Controllability beyond Lithography Limit
-
批准号:10450112
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$8.7万
-
财政年份:1998
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Study on Performance Increase and Fluctuation Suppression in Thin Film SOI MOSFET by utilizing quantum effects
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批准号:10555117
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项目类别:Grant-in-Aid for Scientific Research (B).
-
资助金额:$8.06万
-
财政年份:1998
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负责人:HIRAMOTO Toshiro
-
依托单位:
Investigation of Oxidation Mechanisms in SOI Structures
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批准号:08455161
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$4.86万
-
财政年份:1996
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Fluctuations of Characteristics in Sub-0.1mum Thin Film SOI CMOS LSI Devices
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批准号:07555109
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$6.78万
-
财政年份:1995
-
负责人:HIRAMOTO Toshiro
-
依托单位:
国内基金
海外基金
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