Development of coherence diffraction imaging for high-harmonic-generation EUV source
Development of coherence diffraction imaging for high-harmonic-generation EUV source
批准号:
22760029
负责人:
HARADA Tetsuo
金额:
$2.66万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2011
中文摘要
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英文摘要
Image reconstruction method for a lensless microscope was developed to observe EUV-mask patterns. The microscope equipped with standalone EUV source of high harmonic generation, which temporal coherence was not enough to reconstruct the pattern image. To improve the coherence, we fabricated a grating for a monochromator.
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Critical Dimension Evaluation of an EUV Mask utilizing the Coherent EUV Scatterometry Microscope
利用相干 EUV 散射测量显微镜评估 EUV 掩模的关键尺寸
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[Tetsuo Harada, Masato Nakasuji, Masaki Tada, Takeo Watanabe, Hiroo Kinoshita]
通讯作者:
Hiroo Kinoshita
Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU
NewSUBARU 利用相干极紫外散射显微镜测量极紫外掩模的临界尺寸
DOI:
10.1143/jjap.50.06gb03
发表时间:
2011
期刊:
Jpn. J. Appl. Phys
影响因子:
--
作者:
[Tetsuo Harada, Masato Nakasuji, Masaki Tada, Yutaka Nagata, Takeo Watanabe, and Hiroo Kinoshita]
通讯作者:
and Hiroo Kinoshita
Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet Mask Inspection and Metrology
开发用于极紫外掩模检测和计量的具有高次谐波发生源的相干极紫外散射测量显微镜
DOI:
--
发表时间:
2012
期刊:
Jpn. J. Appl. Phys
影响因子:
--
作者:
[Masato Nakasuji, Akifumi Tokimasa, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe, Katsumi Midorikawa, Hiroo Kinoshita]
通讯作者:
Hiroo Kinoshita
コヒーレントスキャトロメトリー顕微鏡によるEUVマスク検査
使用相干散射显微镜进行 EUV 掩模检查
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[原田哲男, 中筋正人, 渡邊健夫, 永田豊, 木下博雄]
通讯作者:
木下博雄
コヒーレントスキャトロメトリー顕微鏡によるCD評価
使用相干散射显微镜进行 CD 评估
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[中筋正人, 多田将樹, 原田哲男, 渡邊健夫,木下博雄]
通讯作者:
渡邊健夫,木下博雄
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国内基金
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